等離子刻蝕機的工作原理和注意事項Working principle and precautions of plasma etcher

工作原理 平面刻蝕是在兩塊平面電極之間進行刻蝕，它與常見的感應耦合等離子體（ICP）不同，是通過高壓線圈產生的。我們的SCE系列鋁制反應艙等離子體系統是該領域Z新的產品。

等離子刻蝕機的注意事項 

#.在設備工作時,禁止扶、靠設備，禁止觸摸高頻電纜和線圈，以免發生意外

#.高頻電源實際使用功率不能超過Z大限制#.檢查設備時，必須關機后切斷電源 

#. 工作場地必須保持清潔、干燥，設備上及設備周圍不得放置無關物品，特別是易燃、易爆物品 

#.長期停放時注意防潮，拆除電源進線，每隔3-5天開一次機，保證反應室真空以免被污 染 

#.設備停機、過夜也要保持反應室真空，如停機較長時間后再進行刻蝕工藝，需先進行一次空載刻蝕，再刻蝕硅片

       Working principle plane etching is performed between two plane electrodes, which is different from the common inductively coupled plasma (ICP), and is produced by high-voltage coil. Our SCE series aluminum reaction chamber plasma system is the latest product in this field. 

       Precautions for plasma etching machine, 

       #.Do not hold or lean on the equipment, and do not touch the high-frequency cable and coil to avoid accidents. 

       #. The actual power of high-frequency power supply cannot exceed the maximum limit.# When checking the equipment, the power supply must be cut off after shutdown. 

       #. The working site must be kept clean and dry. No irrelevant items, especially inflammable and explosive items, shall be placed on and around the equipment. 

       #. When parking for a long time, pay attention to moisture-proof, remove the power incoming line, and open the machine every 3-5 days to ensure that the vacuum in the reaction room is not polluted.

       #. When the equipment is shut down or overnight, the vacuum in the reaction chamber shall be maintained. If the equipment is shut down for a long time, then the etching process shall be carried out. In addition, one no-load etching shall be carried out first, and then the silicon wafer shall be etched