真空等離子清洗原理Principle of vacuum plasma cleaning

真空等離子清洗原理

    等離子體是物質的一種存在狀態，通常物質以固態、液態、氣態三種狀態存在，但在一些特殊的情況下有第四種狀態存在，如地球大氣中電離層中的物質。等離子體狀態中存在下列物質：處于高速運動狀態的電子；處于激活狀態的中性原子、分子、原子團（自由基）；離子化的原子、分子；未反應的分子、原子等，但物質在總體上仍保持電中性狀態。

    在真空腔體里，通過射頻電源在一定的壓力情況下起輝產生高能量的無序的等離子體，通過等離子體轟擊被清洗產品表面．以達到清洗目的。

                                                                           Principle of vacuum plasma cleaning

    Plasma is an existing state of matter. Usually, matter exists in three states: solid state, liquid state and gas state, but in some special cases, there is a fourth state, such as the material in the ionosphere in the earth's atmosphere. The following substances exist in the plasma state: electrons in high-speed motion; Neutral atoms, molecules and atomic groups (free radicals) in the activated state; Ionized atoms and molecules; Unreacted molecules, atoms, etc., but the substance remains electrically neutral as a whole.

    In the vacuum chamber, high-energy disordered plasma is generated by RF power supply under certain pressure, and the cleaned product surface is bombarded by plasma to achieve the purpose of cleaning.